화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Growth and characterization of nitrogen-phosphorus hybrid passivated gate oxide film on N-type 4H-SiC epilayer
Jia YF, Lv HL, Tang XY, Han C, Song QW, Zhang YM, Zhang YM, Dimitrijev S, Han JS
Journal of Crystal Growth, 507, 98, 2019
2 The impact of post-polysilicon gate process on ultra-thin gate oxide integrity
Ang CH, Ko LH, Lin WH, Zheng JZ
Solid-State Electronics, 46(2), 243, 2002
3 Impact of nitrogen and/or fluorine implantation on deep-submicron Co-salicide process
Chang TY, Lei TF, Chao TS, Chen SW, Kao LM, Chen SK, Tuan A, Su TP
Solid-State Electronics, 46(8), 1097, 2002
4 Method for Studying the Grown-in Defect Density Spectra in Czochralski Silicon-Wafers
Kissinger G, Graf D, Lambert U, Richter H
Journal of the Electrochemical Society, 144(4), 1447, 1997
5 Formation Behavior of Infrared Light-Scattering Defects in Silicon During Czochralski Crystal-Growth
Hourai M, Nagashima T, Kajita E, Miki S, Shigematsu T, Okui M
Journal of the Electrochemical Society, 142(9), 3193, 1995