검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Study of resistive random access memory based on TiN/TaOx/TiN integrated into a 65 nm advanced complementary metal oxide semiconductor technology Diokh T, Le-Roux E, Jeannot S, Cagli C, Jousseaume V, Nodin JF, Gros-Jean M, Gaumer C, Mellier M, Cluzel J, Carabasse C, Candelier P, De Salvo B Thin Solid Films, 533, 24, 2013 |
| 2 |
Soft X-ray photoemission study of nitrogen diffusion in TiN/HfO:N gate stacks Martinez E, Gaumer C, Lhostis S, Licitra C, Silly M, Sirotti F, Renault O Applied Surface Science, 258(6), 2107, 2012 |
| 3 |
Investigation of HfO2 and ZrO2 for Resistive Random Access Memory applications Salaun A, Grampeix H, Buckley J, Mannequin C, Vallee C, Gonon P, Jeannot S, Gaumer C, Gros-Jean M, Jousseaume V Thin Solid Films, 525, 20, 2012 |
| 4 |
Chemical and Structural Properties of a TaN/HfO2 Gate Stack Processed Using Atomic Vapor Deposition Gaumer C, Martinez E, Lhostis S, Wiemer C, Perego M, Loup V, Lafond D, Fabbri JM Journal of the Electrochemical Society, 156(7), G78, 2009 |
| 5 |
Electrical and Chemical Properties of the HfO2/SiO2/Si Stack: Impact of HfO2 Thickness and Thermal Budget Martinez E, Leroux C, Benedetto N, Gaumer C, Charbonnier M, Licitra C, Guedj C, Fillot F, Lhostis S Journal of the Electrochemical Society, 156(8), G120, 2009 |