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| No. | Article |
|---|---|
| 1 |
Selective Chemical-Vapor-Deposition of Copper Using (Hfac) Copper(I) Vinyltrimethylsilane in the Absence and Presence of Water Jain A, Gelatos AV, Kodas TT, Hampdensmith MJ, Marsh R, Mogab CJ Thin Solid Films, 262(1-2), 52, 1995 |