1 |
FTIR-ATR spectroscopy in thin film studies: The importance of sampling depth and deposition substrate Laroche G, Fitremann J, Gherardi N Applied Surface Science, 273, 632, 2013 |
2 |
Ultrasmooth Silver Thin Film Electrodes with High Polar Liquid Wettability for OLED Microcavity Application Cioarec C, Melpignano P, Gherardi N, Clergereaux R, Villeneuve C Langmuir, 27(7), 3611, 2011 |
3 |
Anti-Fog Layer Deposition onto Polymer Materials: A Multi-Step Approach Maechler L, Sarra-Bournet C, Chevallier P, Gherardi N, Laroche G Plasma Chemistry and Plasma Processing, 31(1), 175, 2011 |
4 |
Effect of C2H4/N-2 Ratio in an Atmospheric Pressure Dielectric Barrier Discharge on the Plasma Deposition of Hydrogenated Amorphous Carbon-Nitride Films (a-C:N:H) Sarra-Bournet C, Gherardi N, Glenat H, Laroche G, Massines F Plasma Chemistry and Plasma Processing, 30(2), 213, 2010 |
5 |
Formation of nanoparticles and nanorods in a N-2-C2H4-H-2 atmospheric pressure dielectric barrier Townsend discharge Sarra-Bournet C, Gherardi N, Laroche G, Massines F Thin Solid Films, 518(17), 4828, 2010 |