검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Masked ion beam lithography with highly charged ions Gillaspy JD, Parks DC, Ratliff LP Journal of Vacuum Science & Technology B, 16(6), 3294, 1998 |
| 2 |
Self-Assembled Monolayers Exposed by Metastable Argon and Metastable Helium for Neutral Atom Lithography and Atomic-Beam Imaging Bard A, Berggren KK, Wilbur JL, Gillaspy JD, Rolston SL, Mcclelland JJ, Phillips WD, Prentiss M, Whitesides GM Journal of Vacuum Science & Technology B, 15(5), 1805, 1997 |
| 3 |
Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers Berggren KK, Bard A, Wilbur JL, Gillaspy JD, Helg AG, Mcclelland JJ, Rolston SL, Phillips WD, Prentiss M, Whitesides GM Science, 269(5228), 1255, 1995 |