검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections Myers AM, Lorusso GF, Kim I, Goethals AM, Jonckheere R, Hermans J, Baudemprez B, Ronse K Journal of Vacuum Science & Technology B, 26(6), 2215, 2008 |
| 2 |
Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy Lorusso GF, Goethals AM, Jonckheere R, Hermans J, Ronse K, Myers AM, Niroomand A, Kim I, Niroomand A, Iwamoto F, Ritter D Journal of Vacuum Science & Technology B, 25(6), 2127, 2007 |
| 3 |
Dry development in an O-2/SO2 plasma for sub-0.18 mu m top layer imaging processes Goethals AM, Van Roey F, Sugihara T, Van den Hove L, Vertommen J, Klippert W Journal of Vacuum Science & Technology B, 16(6), 3322, 1998 |
| 4 |
Dry Development for 0.25 Mu-M Top Surface Imaging Vertommen J, Goethals AM Journal of the Electrochemical Society, 144(7), 2461, 1997 |
| 5 |
Quarter-Micron Lithography with a Wet-Silylated and Dry-Developed Commercial Photoresist Gogolides E, Tzevelekis D, Tsoi E, Hatzakis M, Goethals AM, Baik KH, Vanroey F Journal of Vacuum Science & Technology B, 12(6), 3914, 1994 |