| 1 |
Aqueous developable dual switching photoresists for nanolithography
Chen L, Goh YK, Cheng HH, Smith BW, Xie P, Montgomery W, Whittaker AK, Blakey I
Journal of Polymer Science Part A: Polymer Chemistry, 50(20), 4255, 2012 |
| 2 |
Versatile synthetic approach to reversible crosslinked polystyrene networks via RAFT polymerization
Goh YK, Whittaker AK, Monteiro MJ
Journal of Polymer Science Part A: Polymer Chemistry, 45(17), 4150, 2007 |
| 3 |
Novel approach to tailoring molecular weight distribution and structure with a difunctional RAFT agent
Goh YK, Monteiro MJ
Macromolecules, 39(15), 4966, 2006 |
| 4 |
Synthesis of monocyclic and linear polystyrene using the reversible coupling/cleavage of thiol/disulfide groups
Whittaker MR, Goh YK, Gemici H, Legge TM, Perrier S, Monteiro MJ
Macromolecules, 39(26), 9028, 2006 |
| 5 |
Controlled radical polymerization of styrene and methyl acrylate in the presence of reversible addition-fragmentation chain transfer agents, phenylethyl phenyl dithioacetate and phenyldithioacetic acid
Goh YK, Whittaker MR, Monteiro MJ
Journal of Polymer Science Part A: Polymer Chemistry, 43(21), 5232, 2005 |
| 6 |
Effect of impurities in cumyl dithiobenzoate on RAFT-mediated polymerizations
Plummer R, Goh YK, Whittaker AK, Monteiro MJ
Macromolecules, 38(12), 5352, 2005 |
