검색결과 : 8건
No. | Article |
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1 |
Assessment of an energy-efficient aircraft concept from a techno-economic perspective Goldberg C, Nalianda D, Sethi V, Pilidis P, Singh R, Kyprianidis K Applied Energy, 221, 229, 2018 |
2 |
Elastic constants of low-k and barrier dielectric films measured by Brillouin light scattering Carlotti G, Cherault N, Casanova N, Goldberg C, Socino G Thin Solid Films, 493(1-2), 175, 2005 |
3 |
Interlayer mediated epitaxy of cobalt silicide on silicon (100) from low temperature chemical vapor deposition of cobalt -Formation mechanisms and associated properties Londergan AR, Nuesca G, Goldberg C, Peterson G, Kaloyeros AE, Arkles B, Sullivan JJ Journal of the Electrochemical Society, 148(1), C21, 2001 |
4 |
The effects of processing parameters in the chemical vapor deposition of cobalt from cobalt tricarbonyl nitrosyl Ivanova AR, Nuesca G, Chen XM, Goldberg C, Kaloyeros AE, Arkles B, Sullivan JJ Journal of the Electrochemical Society, 146(6), 2139, 1999 |
5 |
Low temperature metal-organic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization Kelsey JE, Goldberg C, Nuesca G, Peterson G, Kaloyeros AE, Arkles B Journal of Vacuum Science & Technology B, 17(3), 1101, 1999 |
6 |
Low temperature metalorganic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization (vol B17, pg 1101, 1999) Kelsey JE, Goldberg C, Nuesca G, Peterson G, Kaloyeros AE, Arkles B Journal of Vacuum Science & Technology B, 17(5), 2193, 1999 |
7 |
The effects of processing parameters in the low-temperature chemical vapor deposition of titanium nitride from tetraiodotitanium Faltermeier CG, Goldberg C, Jones M, Upham A, Knorr A, Ivanova A, Peterson G, Kaloyeros AE, Arkles B Journal of the Electrochemical Society, 145(2), 676, 1998 |
8 |
Barrier Properties of Titanium Nitride Films Grown by Low-Temperature Chemical-Vapor-Deposition from Titanium Tetraiodide Faltermeier C, Goldberg C, Jones M, Upham A, Manger D, Peterson G, Lau J, Kaloyeros AE, Arkles B, Paranjpe A Journal of the Electrochemical Society, 144(3), 1002, 1997 |