화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Assessment of an energy-efficient aircraft concept from a techno-economic perspective
Goldberg C, Nalianda D, Sethi V, Pilidis P, Singh R, Kyprianidis K
Applied Energy, 221, 229, 2018
2 Elastic constants of low-k and barrier dielectric films measured by Brillouin light scattering
Carlotti G, Cherault N, Casanova N, Goldberg C, Socino G
Thin Solid Films, 493(1-2), 175, 2005
3 Interlayer mediated epitaxy of cobalt silicide on silicon (100) from low temperature chemical vapor deposition of cobalt -Formation mechanisms and associated properties
Londergan AR, Nuesca G, Goldberg C, Peterson G, Kaloyeros AE, Arkles B, Sullivan JJ
Journal of the Electrochemical Society, 148(1), C21, 2001
4 The effects of processing parameters in the chemical vapor deposition of cobalt from cobalt tricarbonyl nitrosyl
Ivanova AR, Nuesca G, Chen XM, Goldberg C, Kaloyeros AE, Arkles B, Sullivan JJ
Journal of the Electrochemical Society, 146(6), 2139, 1999
5 Low temperature metal-organic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization
Kelsey JE, Goldberg C, Nuesca G, Peterson G, Kaloyeros AE, Arkles B
Journal of Vacuum Science & Technology B, 17(3), 1101, 1999
6 Low temperature metalorganic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization (vol B17, pg 1101, 1999)
Kelsey JE, Goldberg C, Nuesca G, Peterson G, Kaloyeros AE, Arkles B
Journal of Vacuum Science & Technology B, 17(5), 2193, 1999
7 The effects of processing parameters in the low-temperature chemical vapor deposition of titanium nitride from tetraiodotitanium
Faltermeier CG, Goldberg C, Jones M, Upham A, Knorr A, Ivanova A, Peterson G, Kaloyeros AE, Arkles B
Journal of the Electrochemical Society, 145(2), 676, 1998
8 Barrier Properties of Titanium Nitride Films Grown by Low-Temperature Chemical-Vapor-Deposition from Titanium Tetraiodide
Faltermeier C, Goldberg C, Jones M, Upham A, Manger D, Peterson G, Lau J, Kaloyeros AE, Arkles B, Paranjpe A
Journal of the Electrochemical Society, 144(3), 1002, 1997