화학공학소재연구정보센터
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No. Article
1 Dielectric Constant of Porous Ultra Low-kappa Thin Films
Jousseaume V, Gourhant O, Gonon P, Zenasni A, Favennec L
Journal of the Electrochemical Society, 159(5), G49, 2012
2 Dielectric Constant of Porous Ultra Low-kappa Thin Films (vol 159, pg G49, 2012)
Jousseaume V, Gourhant O, Gonon P, Zenasni A, Favennec L
Journal of the Electrochemical Society, 159(5), S11, 2012
3 Resistive switching of HfO2-based Metal-Insulator-Metal diodes: Impact of the top electrode material
Bertaud T, Walczyk D, Walczyk C, Kubotsch S, Sowinska M, Schroeder T, Wenger C, Vallee C, Gonon P, Mannequin C, Jousseaume V, Grampeix H
Thin Solid Films, 520(14), 4551, 2012
4 Investigation of HfO2 and ZrO2 for Resistive Random Access Memory applications
Salaun A, Grampeix H, Buckley J, Mannequin C, Vallee C, Gonon P, Jeannot S, Gaumer C, Gros-Jean M, Jousseaume V
Thin Solid Films, 525, 20, 2012
5 Comparative study of non-polar switching behaviors of NiO- and HfO2-based oxide resistive-RAMs
Jousseaume V, Fantini A, Nodin JF, Guedj C, Persico A, Buckley J, Tirano S, Lorenzi P, Vignon R, Feldis H, Minoret S, Grampeix H, Roule A, Favier S, Martinez E, Calka P, Rochat N, Auvert G, Barnes JP, Gonon P, Vallee C, Perniola L, De Salvo B
Solid-State Electronics, 58(1), 62, 2011
6 Enhancement of the Double-Layer Capacitance in BaTiO3:H-Based Solid Electrolyte
El Kamel F, Gonon P
Journal of the Electrochemical Society, 157(3), G91, 2010
7 Electrical properties of amorphous barium titanate films sputter deposited under hydrogen containing atmosphere
El Kamel F, Gonon P, Sylvestre A, Vallee C
Journal of Vacuum Science & Technology B, 27(1), 373, 2009
8 Physicochemical and electrical characterizations of atomic layer deposition grown HfO2 on TiN and Pt for metal-insulator-metal application
Jorel C, Vallee C, Gourvest E, Pelissier B, Kahn M, Bonvalot M, Gonon P
Journal of Vacuum Science & Technology B, 27(1), 378, 2009
9 Proton related defects in alpha-BaTiO3:H films based MIM capacitors
El Kamel F, Gonon P
Solid State Ionics, 180(11-13), 853, 2009
10 Electrical properties of low temperature deposited amorphous barium titanate thin films as dielectrics for integrated capacitors
El Kamel F, Gonon P, Jomni F
Thin Solid Films, 504(1-2), 201, 2006