화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Influence of the ion bombardment of O-2 plasmas on low-k materials
Verdonck P, Samara V, Goodyear A, Ferchichi A, Van Besien E, Baklanov MR, Braithwaite N
Thin Solid Films, 520(1), 464, 2011
2 The influence of diffusion of fluorine compounds for silicon lateral etching
Verdonck P, Goodyear A, Braithwaite NS
Thin Solid Films, 459(1-2), 141, 2004
3 Importance of fluorine surface diffusion for plasma etching of silicon
Verdonck P, Goodyear A, Mansano RD, Barroy PRJ, Braithwaite NSJ
Journal of Vacuum Science & Technology B, 20(3), 791, 2002
4 The role of ions in the plasma polymerization of allylamine
Beck AJ, Candan S, Short RD, Goodyear A, Braithwaite NSJ
Journal of Physical Chemistry B, 105(24), 5730, 2001