| 1 |
Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD
Li D, Bulou S, Gautier N, Elisabeth S, Goullet A, Richard-Plouet M, Choquet P, Granier A
Applied Surface Science, 466, 63, 2019 |
| 2 |
TEM analysis of photocatalytic TiO2 thin films deposited on polymer substrates by low-temperature ICP-PECVD
Li D, Gautier N, Dey B, Bulou S, Richard-Plouet M, Ravisy W, Goullet A, Choquet P, Granier A
Applied Surface Science, 491, 116, 2019 |
| 3 |
Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering
Bachar A, Bousquet A, Mehdi H, Monier G, Robert-Goumet C, Thomas L, Belmahi M, Goullet A, Sauvage T, Tomasella E
Applied Surface Science, 444, 293, 2018 |
| 4 |
Nitrogen doping on NiO by reactive magnetron sputtering: A new pathway to dynamically tune the optical and electrical properties
Keraudy J, Ferrec A, Richard-Plouet M, Hamon J, Goullet A, Jouan PY
Applied Surface Science, 409, 77, 2017 |
| 5 |
Effect of growth interruptions on TiO2 films deposited by plasma enhanced chemical vapour deposition
Li D, Goullet A, Carette M, Granier A, Landesman JP
Materials Chemistry and Physics, 182, 409, 2016 |
| 6 |
Structural and dielectric characterization of sputtered Tantalum Titanium Oxide thin films for high temperature capacitor applications
Rouahi A, Challali F, Dakhlaoui I, Vallee C, Salimy S, Jomni F, Yangui B, Besland MP, Goullet A, Sylvestre A
Thin Solid Films, 606, 127, 2016 |
| 7 |
Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering
Keraudy J, Molleja JG, Ferrec A, Corraze B, Richard-Plouet M, Goullet A, Jouan PY
Applied Surface Science, 357, 838, 2015 |
| 8 |
In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition
Li D, Carette M, Granier A, Landesman JP, Goullet A
Applied Surface Science, 283, 234, 2013 |
| 9 |
Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma
Li D, Carette M, Granier A, Landesman JP, Goullet A
Thin Solid Films, 522, 366, 2012 |
| 10 |
A unified analytical and scalable lumped model of RF CMOS spiral inductors based on electromagnetic effects and circuit analysis
Salimy S, Goullet A, Rhallabi A, Challali F, Toutain S, Saubat JC
Solid-State Electronics, 61(1), 38, 2011 |
