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| No. | Article |
|---|---|
| 1 |
Nanoimprint lithography process optimization for the fabrication of high electron mobility transistors Macintyre DS, Chen Y, Gourlay D, Boyd E, Moran D, Cao X, Elgaid K, Stanley CR, Thayne I, Thoms S Journal of Vacuum Science & Technology B, 21(6), 2783, 2003 |