화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Routine growth of InP based device structures using process calibration with optical in-situ techniques
Wolfram P, Steimetz E, Ebert W, Grote N, Zettler JT
Journal of Crystal Growth, 272(1-4), 118, 2004
2 Surface quality of InP etched with tertiarybutylchloride in an MOVPE reactor
Franke D, Sabelfeld N, Ebert W, Harde P, Wolfram P, Grote N
Journal of Crystal Growth, 248, 421, 2003
3 Comparison of MOVPE-based Zn diffusion into InGaAsP/InP using H-2 and N-2 carrier gas
Schroeter-Janssen H, Roehle H, Franke D, Bochnia R, Harde P, Grote N
Journal of Crystal Growth, 221, 70, 2000
4 MOVPE-based in situ etching of In(GaAs)P/InP using tertiarybutylchloride
Wolfram P, Ebert W, Kreissl J, Grote N
Journal of Crystal Growth, 221, 177, 2000