화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Reactive magnetron sputtering from a composite target for large area BaPbO3 thin film electrode
Vidyarthi VS, Suchaneck G, Gerlach G, Levin AA, Meyer DC, Grotzschel R
Thin Solid Films, 518(15), 4106, 2010
2 Implantation-caused open volume defects in Ge after flash lamp annealing (FLA) probed by slow positron implantation spectroscopy (SPIS)
Anwand W, Skorupa W, Schumann T, Posselt M, Schmidt B, Grotzschel R, Brauer G
Applied Surface Science, 255(1), 81, 2008
3 P implantation into preamorphized germanium and subsequent annealing: Solid phase epitaxial regrowth, P diffusion, and activation
Posselt M, Schmidt B, Anwand W, Grotzschel R, Heera V, Mucklich A, Wundisch C, Skorupa W, Hortenbach H, Gennaro S, Bersani M, Giubertoni D, Moller A, Bracht H
Journal of Vacuum Science & Technology B, 26(1), 430, 2008
4 Grafting of Poly (3-hexylthiophene) from Poly(4-bromostyrene) Films by Kumada Catalyst-Transfer Polycondensation: Revealing of the Composite Films Structure
Khanduyeva N, Senkovskyy V, Beryozkina T, Bocharova V, Simon F, Nitschke M, Stamm M, Grotzschel R, Kiriy A
Macromolecules, 41(20), 7383, 2008
5 Photoluminescence study of C-H and C-D centers in 4H SiC
Bai S, Yan F, Devaty RP, Choyke WJ, Grotzschel R, Wagner G, MacMillan MF
Materials Science Forum, 457-460, 589, 2004
6 Investigating contaminants on thermochemically refined surfaces of chemical vapor deposited diamond films
Weima JA, von Borany J, Grotzschel R, Fahrner WR
Journal of the Electrochemical Society, 149(5), G301, 2002
7 Phenomenological model of reactive r.f.-magnetron sputtering of Si in Ar/O-2 atmosphere for the prediction of SiOx thin film stoichiometry from process parameters
Seifarth H, Schmidt JU, Grotzschel R, Klimenkov M
Thin Solid Films, 389(1-2), 108, 2001
8 Preparation of SiO2 films with embedded Si nanocrystals by reactive rf magnetron sputtering
Seifarth H, Grotzschel R, Markwitz A, Matz W, Nitzsche P, Rebohle L
Thin Solid Films, 330(2), 202, 1998