화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Highly transparent photoelectrochromic device based on carbon quantum dots sensitized photoanode
Shen K, Luo G, Liu J, Zheng JM, Xu CY
Solar Energy Materials and Solar Cells, 193, 372, 2019
2 Highly transparent, all-oxide, heteroepitaxy ferroelectric thin film for flexible electronic devices
Ren CL, Tan CB, Gong LJ, Tang MK, Liao M, Tang Y, Zhong XL, Guo HX, Wang JB
Applied Surface Science, 458, 540, 2018
3 Surface microstructure evolution of highly transparent and conductive Al-doped ZnO thin films and its application in CIGS solar cells
Cheng K, Liu JJ, Jin RR, Liu JL, Liu XS, Lu ZB, Liu Y, Liu XL, Du ZL
Applied Surface Science, 409, 124, 2017
4 Highly transparent, stable, and superhydrophobic coatings based on gradient structure design and fast regeneration from physical damage
Chen Z, Liu XJ, Wang Y, Li J, Guan ZS
Applied Surface Science, 359, 826, 2015
5 Factors limiting the doping efficiency of transparent conductors: A case study of Nb-doped In2O3 epitaxial thin-films
Lozano O, Chen QY, Wadekar PV, Seo HW, Chinta PV, Chu LH, Tu LW, Lo I, Yeh SW, Ho NJ, Chuang FC, Jang DJ, Wijesundera D, Chu WK
Solar Energy Materials and Solar Cells, 113, 171, 2013
6 Transparent and conductive multicomponent oxide films prepared by magnetron sputtering
Minami T
Journal of Vacuum Science & Technology A, 17(4), 1765, 1999
7 Recent advances in electrochromics for smart windows applications
Granqvist CG, Azens A, Hjelm A, Kullman L, Niklasson GA, Ronnow D, Mattsson MS, Veszelei M, Vaivars G
Solar Energy, 63(4), 199, 1998
8 New transparent conducting ZnO-In2O3-SnO2 thin films prepared by magnetron sputtering
Minami T, Kakumu T, Shimokawa K, Takata S
Thin Solid Films, 317(1-2), 318, 1998
9 Preparation of transparent conducting Zn2In2O5 films by d.c. magnetron sputtering
Minami T, Kakumu T, Takeda Y, Takata S
Thin Solid Films, 317(1-2), 326, 1998
10 Transparent conductive ZnO film preparation by alternating sputtering of ZnO : Al and Zn or Al targets
Tominaga K, Umezu N, Mori I, Ushiro T, Moriga T, Nakabayashi I
Thin Solid Films, 334(1-2), 35, 1998