화학공학소재연구정보센터
검색결과 : 14건
No. Article
1 Structural basis of the cystein protease inhibitor Clonorchis sinensis Stefin-1
Park SY, Jeong MS, Park SA, Ha SC, Na BK, Jang SB
Biochemical and Biophysical Research Communications, 498(1), 9, 2018
2 Structural and functional study of ChuY from Escherichia coli strain CFT073
Kim H, Chaurasia AK, Kim T, Choi J, Ha SC, Kim D, Kim KK
Biochemical and Biophysical Research Communications, 482(4), 1176, 2017
3 Structural and kinetic bases for the metal preference of the M18 aminopeptidase from Pseudomonas aeruginosa
Nguyen DD, Pandian R, Kim D, Ha SC, Yoon HJ, Kim KS, Yun KH, Kim JH, Kim KK
Biochemical and Biophysical Research Communications, 447(1), 101, 2014
4 Structural insights into the histidine trimethylation activity of EgtD from Mycobacterium smegmatis
Jeong JH, Cha HJ, Ha SC, Rojviriya C, Kim YG
Biochemical and Biophysical Research Communications, 452(4), 1098, 2014
5 Crystal structure of a key enzyme in the agarolytic pathway, alpha-neoagarobiose hydrolase from Saccharophagus degradans 2-40
Ha SC, Lee S, Lee J, Kim HT, Ko HJ, Kim KH, Choi IG
Biochemical and Biophysical Research Communications, 412(2), 238, 2011
6 Development of cost innovative BPs for a PEMFC stack for a 1 kW-class residential power generator (RPG) system
Lee GY, Jung MK, Ryoo SN, Park MS, Ha SC, Kim S
International Journal of Hydrogen Energy, 35(23), 13131, 2010
7 Purification of human transcription factors Nanog and Sox2, each in complex with Skp, an Escherichia coli periplasmic chaperone
Ha SC, Pereira JH, Jeong JH, Huh JH, Kim SH
Protein Expression and Purification, 67(2), 164, 2009
8 Fabrication of cobalt-organic composite thin film via plasma-enhanced chemical vapor deposition for antibacterial applications
Jeong YM, Lee JK, Ha SC, Kim SH
Thin Solid Films, 517(9), 2855, 2009
9 Characterizations of pulsed chemical vapor deposited-tungsten thin films for ultrahigh aspect ratio W-plug process
Kim SH, Hwang ES, Ha SC, Pyi SH, Sun HJ, Lee JW, Kawk N, Kim JK, Sohn H, Kim J
Journal of the Electrochemical Society, 152(6), C408, 2005
10 Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
Ha SC, Choi E, Kim SH, Roh JS
Thin Solid Films, 476(2), 252, 2005