화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Low-temperature (< 450 degrees C), plasma-assisted deposition of poly-Si thin films on SiO2 and glass through interface engineering (vol 15, pg 1035, 1997)
Wolfe DM, Wang F, Habermehl S, Lucovsky G
Journal of Vacuum Science & Technology A, 16(1), 207, 1998
2 Ion-Surface Interactions in Low-Temperature Silicon Epitaxy by Remote Plasma-Enhanced Chemical-Vapor-Deposition
Habermehl S, Lucovsky G
Journal of Vacuum Science & Technology A, 14(6), 3024, 1996
3 Heteroepitaxial Growth of Si on Gap and GaAs-Surfaces by Remote, Plasma-Enhanced Chemical-Vapor-Deposition
Habermehl S, Dietz N, Lu Z, Bachmann KJ, Lucovsky G
Journal of Vacuum Science & Technology A, 12(4), 990, 1994