검색결과 : 3건
No. | Article |
---|---|
1 |
Low-temperature (< 450 degrees C), plasma-assisted deposition of poly-Si thin films on SiO2 and glass through interface engineering (vol 15, pg 1035, 1997) Wolfe DM, Wang F, Habermehl S, Lucovsky G Journal of Vacuum Science & Technology A, 16(1), 207, 1998 |
2 |
Ion-Surface Interactions in Low-Temperature Silicon Epitaxy by Remote Plasma-Enhanced Chemical-Vapor-Deposition Habermehl S, Lucovsky G Journal of Vacuum Science & Technology A, 14(6), 3024, 1996 |
3 |
Heteroepitaxial Growth of Si on Gap and GaAs-Surfaces by Remote, Plasma-Enhanced Chemical-Vapor-Deposition Habermehl S, Dietz N, Lu Z, Bachmann KJ, Lucovsky G Journal of Vacuum Science & Technology A, 12(4), 990, 1994 |