검색결과 : 1건
No. | Article |
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1 |
Single-Layer Chemically Amplified Photoresists for 193-nm Lithography Wallraff GM, Allen RD, Hinsberg WD, Larson CF, Johnson RD, Dipietro R, Breyta G, Hacker N, Kunz RR Journal of Vacuum Science & Technology B, 11(6), 2783, 1993 |