| 1 |
Wide-bandgap HfO2-V2O5 nanowires heterostructure for visible light-driven photocatalytic degradation
Sari FNI, Lu SH, Ting JM
Journal of the American Ceramic Society, 103(3), 2252, 2020 |
| 2 |
The peculiarities of structural and optical properties of HfO2-based films co-doped with silicon and erbium
Khomenkova L, Korsunska N, Labbe C, Fortier X, Gourbilleau F
Applied Surface Science, 471, 521, 2019 |
| 3 |
Al2O3/Si0.7Ge0.3(001) & HfO2/Si(0.7)Ge0.3(001) interface trap state reduction via in-situ N-2/H-2 RF downstream plasma passivation
Breeden M, Wolf S, Ueda S, Fang ZW, Chang CY, Tang KC, McIntyre P, Kummel AC
Applied Surface Science, 478, 1065, 2019 |
| 4 |
Ferroelectric properties of SOS and SOI pseudo-MOSFETs with HfO2 interlayers
Popov VP, Antonov VA, Ilnitsky MA, Tyschenko IE, Vdovin VI, Miakonkikh AV, Rudenko KV
Solid-State Electronics, 159, 63, 2019 |
| 5 |
Ultrathin monolithic HfO2 formed by Hf-seeded atomic layer deposition on MoS2: Film characteristics and its transistor application
Kim H, Park T, Park S, Leem M, Ahn W, Lee H, Lee C, Lee E, Jeong SJ, Park S, Kim Y, Kim H
Thin Solid Films, 673, 112, 2019 |
| 6 |
Effect of furnace annealing on the ferroelectricity of Hf0.5 Zr0.5O2 thin films
Shekhawat A, Walters G, Chung CC, Garcia R, Liu Y, Jones J, Nishida T, Moghaddam S
Thin Solid Films, 677, 142, 2019 |
| 7 |
Influence of oxygen vacancies in ALD HfO2-x thin films on non-volatile resistive switching phenomena with a Ti/HfO2-x/Pt structure
Sokolov AS, Jeon YR, Kim S, Ku B, Lim D, Han H, Chae MG, Lee J, Ha BG, Choi C
Applied Surface Science, 434, 822, 2018 |
| 8 |
High performance graphene-silicon Schottky junction solar cells with HfO2 interfacial layer grown by atomic layer deposition
Alnuaimi A, Almansouri I, Saadat I, Nayfeh A
Solar Energy, 164, 174, 2018 |
| 9 |
Enhanced field effect passivation of c-Si surface via introduction of trap centers: Case of hafnium and aluminium oxide bilayer films deposited by thermal ALD
Panigrahi J, Vandana, Singh R, Singh PK
Solar Energy Materials and Solar Cells, 188, 219, 2018 |
| 10 |
Electrical and chemical characterizations of hafnium (IV) oxide films for biological lab-on-a-chip devices
Collins JL, Hernandez HM, Habibi S, Kendrick CE, Wang Z, Bihari N, Bergstrom PL, Minerick AR
Thin Solid Films, 662, 60, 2018 |
