화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Evolution of a highly active and enantiospecific metalloenzyme from short peptides
Studer S, Hansen DA, Pianowski ZL, Mittl PRE, Debon A, Guffy SL, Der BS, Kuhlman B, Hilvert D
Science, 362(6420), 1285, 2018
2 Identification of a Thioesterase Bottleneck in the Pikromycin Pathway through Full-Module Processing of Unnatural Pentaketides
Hansen DA, Koch AA, Sherman DH
Journal of the American Chemical Society, 139(38), 13450, 2017
3 A Single Active Site Mutation in the Pikromycin Thioesterase Generates a More Effective Macrocyclization Catalyst
Koch AA, Hansen DA, Shende VV, Furan LR, Houk KN, Jimenez-Oses G, Sherman DH
Journal of the American Chemical Society, 139(38), 13456, 2017
4 Evolution of Efficient Modular Polyketide Synthases by Homologous Recombination
Chemler JA, Tripathi A, Hansen DA, O'Neil-Johnson M, Williams RB, Starks C, Park SR, Sherman DH
Journal of the American Chemical Society, 137(33), 10603, 2015
5 Substrate Controlled Divergence in Polyketide Synthase Catalysis
Hansen DA, Koch AA, Sherman DH
Journal of the American Chemical Society, 137(11), 3735, 2015
6 Directing Group-Controlled Regioselectivity in an Enzymatic C-H Bond Oxygenation
Negretti S, Narayan ARH, Chiou KC, Kells PM, Stachowski JL, Hansen DA, Podust LM, Montgomery J, Sherman DH
Journal of the American Chemical Society, 136(13), 4901, 2014
7 Structure of a modular polyketide synthase
Dutta S, Whicher JR, Hansen DA, Hale WA, Chemler JA, Congdon GR, Narayan ARH, Hakansson K, Sherman DH, Smith JL, Skiniotis G
Nature, 510(7506), 512, 2014
8 Structural rearrangements of a polyketide synthase module during its catalytic cycle
Whicher JR, Dutta S, Hansen DA, Hale WA, Chemler JA, Dosey AM, Narayan ARH, Hakansson K, Sherman DH, Smith JL, Skiniotis G
Nature, 510(7506), 560, 2014
9 Polishing parameter dependencies and surface oxidation of chemical mechanical polishing of Al thin films
Wrschka P, Hernandez J, Hsu Y, Kuan TS, Oehrlein GS, Sun HJ, Hansen DA, King J, Fury MA
Journal of the Electrochemical Society, 146(7), 2689, 1999
10 Chemical mechanical polishing of Al and SiO2 thin films: The role of consumables
Hernandez J, Wrschka P, Hsu Y, Kuan TS, Oehrlein GS, Sun HJ, Hansen DA, King J, Fury MA
Journal of the Electrochemical Society, 146(12), 4647, 1999