검색결과 : 1건
No. | Article |
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1 |
Removal of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures Vos R, Lux M, Xu K, Fyen W, Kenens C, Conard T, Mertens P, Heyns M, Hatcher Z, Hoffman M Journal of the Electrochemical Society, 148(12), G683, 2001 |