화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Depth profile analysis of ultrathin silicon oxynitride films by ToF-SIMS
Douglas MA, Hattangady S, Eason K
Journal of the Electrochemical Society, 147(5), 1893, 2000
2 Modeling and optimization of oxynitride gate dielectrics formation by remote plasma nitridation of silicon dioxide
Kapila D, Hattangady S, Douglas M, Kraft R, Gribelyuk M
Journal of the Electrochemical Society, 146(3), 1111, 1999
3 Surface Nitridation of Silicon Dioxide with a High-Density Nitrogen Plasma
Kraft R, Schneider TP, Dostalik WW, Hattangady S
Journal of Vacuum Science & Technology B, 15(4), 967, 1997