검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography Cardinale GF, Henderson CC, Goldsmith JEM, Mangat PJS, Cobb J, Hector SD Journal of Vacuum Science & Technology B, 17(6), 2970, 1999 |
| 2 |
Extreme ultraviolet lithography mask patterning and printability studies with a Ta-based absorber Mangat PJS, Hector SD, Thompson MA, Dauksher WJ, Cobb J, Cummings KD, Mancini DP, Resnick DJ, Cardinale G, Henderson C, Kearney P, Wedowski M Journal of Vacuum Science & Technology B, 17(6), 3029, 1999 |
| 3 |
Printability of Sub-150 nm Features in X-Ray-Lithography - Theory and Experiments Hector SD, Wong VV, Smith HI, Mccord MA, Rhee KW Journal of Vacuum Science & Technology B, 12(6), 3965, 1994 |
| 4 |
Wavelength Dependence of Exposure Window and Resist Profile in X-Ray-Lithography Guo JZ, Celler GK, Maldonado JR, Hector SD Journal of Vacuum Science & Technology B, 12(6), 4044, 1994 |
| 5 |
Fabrication of 100-nm T-Gates for Monolithic Microwave Integrated-Circuits Using X-Ray-Lithography Gupta N, Hector SD, Rhee KW, Smith HI Journal of Vacuum Science & Technology B, 11(6), 2625, 1993 |
| 6 |
Simultaneous-Optimization of Spectrum, Spatial Coherence, Gap, Feature Bias, and Absorber Thickness in Synchrotron-Based X-Ray-Lithography Hector SD, Smith HI, Schattenburg ML Journal of Vacuum Science & Technology B, 11(6), 2981, 1993 |