검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
C2F6/O-2 and C3F8/O-2 plasmas SiO2 etch rates, impedance analysis, and discharge emissions Entley WR, Hennessy WJ, Langan JG Electrochemical and Solid State Letters, 3(2), 99, 2000 |
| No. | Article |
|---|---|
| 1 |
C2F6/O-2 and C3F8/O-2 plasmas SiO2 etch rates, impedance analysis, and discharge emissions Entley WR, Hennessy WJ, Langan JG Electrochemical and Solid State Letters, 3(2), 99, 2000 |