화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 On the problem of rotational-state-dependent molecule-surface interaction: Relaxation, accommodation and trapping at low J
Pankov AY, Krylov SY, van Duijn EJ, Hermans LJF
Journal of Chemical Physics, 112(19), 8680, 2000
2 Etching of Si through a thick condensed XeF2 layer
Sebel PGM, Hermans LJF, Beijerinck HCW
Journal of Vacuum Science & Technology A, 18(5), 2090, 2000
3 Reaction layer dynamics in ion-assisted Si/XeF2 etching: Temperature dependence
Sebel PGM, Hermans LJF, Beijerinck HCW
Journal of Vacuum Science & Technology A, 18(6), 2759, 2000
4 Silicon etch rate enhancement by traces of metal
Sebel PGM, Hermans LJF, Beijerinck HCW
Journal of Vacuum Science & Technology A, 17(3), 755, 1999
5 Reaction layer dynamics in ion-assisted Si/XeF2 etching: Ion flux dependence
Sebel PGM, Hermans LJF, Beijerinck HCW
Journal of Vacuum Science & Technology A, 17(6), 3368, 1999
6 Rotational- and vibrational-state resolved HF-surface interactions investigated by surface light-induced drift
vanDuijn EJ, Nokhai R, Hermans LJF, Pankov AY, Krylov SY
Journal of Chemical Physics, 107(10), 3999, 1997