| 1 |
Investigation of the kinetics of tungsten chemical mechanical polishing in potassium iodate-based slurries - I. Role of alumina and potassium iodate
Stein DJ, Hetherington DL, Cecchi JL
Journal of the Electrochemical Society, 146(1), 376, 1999 |
| 2 |
Investigation of the kinetics of tungsten chemical mechanical polishing in potassium iodate-based slurries II. Roles of colloid species and slurry chemistry
Stein DJ, Hetherington DL, Cecchi JL
Journal of the Electrochemical Society, 146(5), 1934, 1999 |
| 3 |
Plasma-Induced Damage of GaAs PN-Junction Diodes Using Electron-Cyclotron-Resonance Generated Cl-2/Ar, BCl3/Ar, Cl-2/BCl3/Ar, and Sicl4/Ar Plasmas
Shul RJ, Lovejoy ML, Hetherington DL, Rieger DJ, Klem JF, Melloch MR
Journal of Vacuum Science & Technology B, 13(1), 27, 1995 |
| 4 |
Investigation of Plasma Etch Induced Damage in Compound Semiconductor-Devices
Shul RJ, Lovejoy ML, Hetherington DL, Rieger DJ, Vawter GA, Klem JF, Melloch MR
Journal of Vacuum Science & Technology A, 12(4), 1351, 1994 |
