검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Structural, optical and dielectric characterization of Au/HfO2/(Pt,TiN) capacitors El Kamel F, Ben Cheikh Z, Soussou MA, Moadhen A, Khirouni K Thin Solid Films, 645, 282, 2018 |
| 2 |
Effects of substrate temperature on the structural, optical and resistive switching properties of HfO2 films Du QQ, Wang WJ, Li SH, Zhang D, Zheng WQ Thin Solid Films, 608, 21, 2016 |
| 3 |
Microstructure of hard and optically transparent HfO2 films prepared by high-power impulse magnetron sputtering with a pulsed oxygen flow control Pi NW, Zhang MH, Jiang JC, Belosludtsev A, Vlcek J, Houska J, Meletis EI Thin Solid Films, 619, 239, 2016 |
| 4 |
High laser-induced damage threshold HfO2 films prepared by ion-assisted electron beam evaporation Zhang DW, Fan SH, Zhao YN, Gao WD, Shao JD, Fan RY, Wang YJ, Fan ZX Applied Surface Science, 243(1-4), 232, 2005 |
| 5 |
Interface of ultrathin HfO2 films deposited by UV-photo-CVD Fang Q, Zhang JY, Wang Z, Modreanu M, O'Sullivan BJ, Hurley PK, Leedham TL, Hywel D, Audier MA, Jimenez C, Senateur JP, Boyd IW Thin Solid Films, 453-54, 203, 2004 |
| 6 |
Investigation of TiO2-doped HfO2 thin films deposited by photo-CVD Fang Q, Zhang JY, Wang ZM, Wu JX, O'Sullivan BJ, Hurley PK, Leedham TL, Davies H, Audier MA, Jimenez C, Senateur JP, Boyd IW Thin Solid Films, 428(1-2), 263, 2003 |
| 7 |
Atomic layer deposition of polycrystalline HfO2 films by the HfI4-O-2 precursor combination Sundqvist J, Harsta A, Aarik J, Kukli K, Aidla A Thin Solid Films, 427(1-2), 147, 2003 |
| 8 |
Etch characteristics of HfO2 films on Si substrates Norasetthekul S, Park PY, Baik KH, Lee KP, Shin JH, Jeong BS, Shishodia V, Norton DP, Pearton ST Applied Surface Science, 187(1-2), 75, 2002 |