| 1 |
고밀도 C4F8 플라즈마에서 증착된 불화탄소막의 광학적 및 전기적 특성
권혁규, 유상현, 김준현, 김창구
Korean Chemical Engineering Research, 59(2), 254, 2021 |
| 2 |
A comparative study on the direct deposition of mu c-Si:H and plasma-induced recrystallization of a-Si:H: Insight into Si crystallization in a high-density plasma
Zhou HP, Xu M, Xu S, Feng YY, Xu LX, Wei DY, Xiao SQ
Applied Surface Science, 433, 285, 2018 |
| 3 |
Nanometer-scale etching of CoFeB thin films using pulse-modulated high density plasma
Cho DH, Lee JY, Choi JS, Chung CW
Current Applied Physics, 18(9), 968, 2018 |
| 4 |
Nanometer-scale etching of CoFeB thin films using pulse-modulated high density plasma
Cho DH, Lee JY, Choi JS, Chung CW
Current Applied Physics, 18(9), 968, 2018 |
| 5 |
Dry etching of palladium thin films in high density plasmas of CH3OH/Ar, C2H5OH/Ar, CH4/Ar, and CH4/O-2/Ar gas mixtures
Lee JY, Choi JS, Cho DH, Hwang SM, Chung CW
Thin Solid Films, 636, 325, 2017 |
| 6 |
Extended dielectric relaxation scheme for fluid transport simulations of high density plasma discharges
Kwon DC, Choi H, Yu DH, Lee HC, Choe HH, Yoon NS
Current Applied Physics, 16(6), 644, 2016 |
| 7 |
A cutoff probe for the measurement of high density plasma
You KH, You SJ, Kim DW, Na BK, Seo BH, Kim JH, Shin YH, Seong DJ, Chang HY
Thin Solid Films, 547, 250, 2013 |
| 8 |
Influence of CH4 flow rate on properties of HF-PECVD a-SiC films and solar cell application
Lien SY, Weng KW, Huang JJ, Hsu CH, Shen CT, Wang CC, Lin YS, Wuu DS, Wu DC
Current Applied Physics, 11(1), S21, 2011 |
| 9 |
Fast deposition of microcrystalline Si films from SiH2Cl2 using a high-density microwave plasma source for Si thin-film solar cells
Saha JK, Ohse N, Hamada K, Matsui H, Kobayashi T, Jia HJ, Shirai H
Solar Energy Materials and Solar Cells, 94(3), 524, 2010 |
| 10 |
Notching characteristics of un-doped amorphous silicon in high density plasma etching
Ko CK, Lee WG
Journal of Industrial and Engineering Chemistry, 15(2), 175, 2009 |
