화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Structural and optical properties of post-annealed atomic-layer-deposited HfO2 thin films on GaAs
Bennett NS, Cherkaoui K, Wong CS, O'Connor E, Monaghan S, Hurley P, Chauhan L, McNally PJ
Thin Solid Films, 569, 104, 2014
2 Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition
King PJ, Werner M, Chalker PR, Jones AC, Aspinall HC, Basca J, Wrench JS, Black K, Davies HO, Heys PN
Thin Solid Films, 519(13), 4192, 2011
3 A study on the etch characteristics of HfAlO3 dielectric thin film in Cl-2/Ar gas chemistry using inductively coupled plasma system
Woo JC, Ha TK, Um DS, Park J, Kang YC, Kim CI
Thin Solid Films, 520(3), 1141, 2011