검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Numeric analysis of the role of liquid phase ultraviolet photochemistry in 193 nm immersion lithography Hinsberg W, Houle F Journal of Vacuum Science & Technology B, 23(6), 2427, 2005 |
| 2 |
Characterization of reactive dissolution and swelling of polymer films using a quartz crystal microbalance and visible and infrared reflectance spectroscopy Hinsberg W, Houle FA, Lee SW, Ito H, Kanazawa K Macromolecules, 38(5), 1882, 2005 |
| 3 |
Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography Raub AK, Frauenglass A, Brueck SRJ, Conley W, Dammel R, Romano A, Sato M, Hinsberg W Journal of Vacuum Science & Technology B, 22(6), 3459, 2004 |
| 4 |
Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance Hinsberg W, Houle FA, Hoffnagle J, Sanchez M, Wallraff G, Morrison M, Frank S Journal of Vacuum Science & Technology B, 16(6), 3689, 1998 |
| 5 |
Thermal and Acid-Catalyzed Deprotection Kinetics in Candidate Deep-Ultraviolet Resist Materials Wallraff G, Hutchinson J, Hinsberg W, Houle F, Seidel P, Johnson R, Oldham W Journal of Vacuum Science & Technology B, 12(6), 3857, 1994 |