검색결과 : 18건
No. | Article |
---|---|
1 |
Force Field Model of Periodic Trends in Biomolecular Halogen Bonds Scholfield MR, Ford MC, Zanden CMV, Billman MM, Ho PS, Rappe AK Journal of Physical Chemistry B, 119(29), 9140, 2015 |
2 |
Oxygen plasma damage to blanket and patterned ultralow-kappa surfaces Bao J, Shi H, Huang H, Ho PS, McSwiney ML, Goodner MD, Moinpour M, Kloster GM Journal of Vacuum Science & Technology A, 28(2), 207, 2010 |
3 |
Small angle X-ray scattering measurements of spatial dependent linewidth in dense nanoline gratings Wang CQ, Fu WE, Li B, Huang H, Soles C, Lin EK, Wu WL, Ho PS, Cresswell MW Thin Solid Films, 517(20), 5844, 2009 |
4 |
Mechanistic study of plasma damage of low k dielectric surfaces Bao J, Shi H, Liu J, Huang H, Ho PS, Goodner MD, Moinpour M, Kloster GM Journal of Vacuum Science & Technology B, 26(1), 219, 2008 |
5 |
Restoration and pore sealing of plasma damaged porous organosilicate low k dielectrics with phenyl containing agents Liu J, Kim W, Bao J, Shi H, Baek W, Ho PS Journal of Vacuum Science & Technology B, 25(3), 906, 2007 |
6 |
Effects of surface chemistry on ALD Ta3N5 barrier formation on low-k dielectrics Liu J, Bao J, Scharnberg M, Kim WC, Ho PS, Laxman R Journal of Vacuum Science & Technology A, 23(4), 1107, 2005 |
7 |
Initial interface formation of Ta-based barriers on SiLK (TM) low dielectric constant films Liu J, Scharnberg M, Bao J, Im J, Ho PS Journal of Vacuum Science & Technology B, 23(4), 1422, 2005 |
8 |
Reduction of the initial defect density and improvement of the reliability of Cu/low-k structures by a methylating treatment Borthakur S, Satyanarayana S, Knorr A, Kraatz M, Ho PS Journal of Vacuum Science & Technology B, 23(5), 2222, 2005 |
9 |
How low-energy ions can enhance depositions on low-K dielectrics Abramowitz P, Kiene M, Ho PS Journal of Vacuum Science & Technology A, 18(5), 2254, 2000 |
10 |
Dielectric anisotropy and molecular orientation of fluorinated polymers confined in submicron trenches Cho TH, Lee JK, Ho PS, Ryan ET, Pellerin JG Journal of Vacuum Science & Technology B, 18(1), 208, 2000 |