화학공학소재연구정보센터
검색결과 : 18건
No. Article
1 Force Field Model of Periodic Trends in Biomolecular Halogen Bonds
Scholfield MR, Ford MC, Zanden CMV, Billman MM, Ho PS, Rappe AK
Journal of Physical Chemistry B, 119(29), 9140, 2015
2 Oxygen plasma damage to blanket and patterned ultralow-kappa surfaces
Bao J, Shi H, Huang H, Ho PS, McSwiney ML, Goodner MD, Moinpour M, Kloster GM
Journal of Vacuum Science & Technology A, 28(2), 207, 2010
3 Small angle X-ray scattering measurements of spatial dependent linewidth in dense nanoline gratings
Wang CQ, Fu WE, Li B, Huang H, Soles C, Lin EK, Wu WL, Ho PS, Cresswell MW
Thin Solid Films, 517(20), 5844, 2009
4 Mechanistic study of plasma damage of low k dielectric surfaces
Bao J, Shi H, Liu J, Huang H, Ho PS, Goodner MD, Moinpour M, Kloster GM
Journal of Vacuum Science & Technology B, 26(1), 219, 2008
5 Restoration and pore sealing of plasma damaged porous organosilicate low k dielectrics with phenyl containing agents
Liu J, Kim W, Bao J, Shi H, Baek W, Ho PS
Journal of Vacuum Science & Technology B, 25(3), 906, 2007
6 Effects of surface chemistry on ALD Ta3N5 barrier formation on low-k dielectrics
Liu J, Bao J, Scharnberg M, Kim WC, Ho PS, Laxman R
Journal of Vacuum Science & Technology A, 23(4), 1107, 2005
7 Initial interface formation of Ta-based barriers on SiLK (TM) low dielectric constant films
Liu J, Scharnberg M, Bao J, Im J, Ho PS
Journal of Vacuum Science & Technology B, 23(4), 1422, 2005
8 Reduction of the initial defect density and improvement of the reliability of Cu/low-k structures by a methylating treatment
Borthakur S, Satyanarayana S, Knorr A, Kraatz M, Ho PS
Journal of Vacuum Science & Technology B, 23(5), 2222, 2005
9 How low-energy ions can enhance depositions on low-K dielectrics
Abramowitz P, Kiene M, Ho PS
Journal of Vacuum Science & Technology A, 18(5), 2254, 2000
10 Dielectric anisotropy and molecular orientation of fluorinated polymers confined in submicron trenches
Cho TH, Lee JK, Ho PS, Ryan ET, Pellerin JG
Journal of Vacuum Science & Technology B, 18(1), 208, 2000