화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Improvement in drain-induced-barrier-lowering and on-state current characteristics of bulk Si fin field-effect-transistors using high temperature Phosphorus extension ion implantation
Kikuchi Y, Hopf T, Mannaert G, Everaert JL, Kubicek S, Eyben P, Waite A, Borniquel JID, Variam N, Mocuta D, Horiguchi N
Solid-State Electronics, 152, 58, 2019
2 Properties and growth peculiarities of Si0.30Ge0.70 stressor integrated in 14 nm fin-based p-type metal-oxide-semiconductor field-effect transistors
Hikavyy A, Rosseel E, Kubicek S, Mannaert G, Favia P, Bender H, Loo R, Horiguchi N
Thin Solid Films, 602, 72, 2016
3 Low-power DRAM-compatible Replacement Gate High-k/Metal Gate Stacks
Ritzenthaler R, Schram T, Bury E, Spessot A, Caillat C, Srividya V, Sebaai F, Mitard J, Ragnarsson LA, Groeseneken G, Horiguchi N, Fazan P, Thean A
Solid-State Electronics, 84, 22, 2013
4 Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques
Redolfi A, Kubicek S, Rooyackers R, Kim MS, Sleeckx E, Devriendt K, Shamiryan D, Vandeweyer T, Delande T, Horiguchi N, Togo M, Wouters JMD, Jurczak M, Hoffmann T, Cockburn A, Gravey V, Diehl DL
Solid-State Electronics, 71, 106, 2012
5 On the efficiency of stress techniques in gate-last n-type bulk FinFETs
Eneman G, Collaert N, Veloso A, De Keersgieter A, De Meyer K, Hoffmann TY, Horiguchi N, Thean A
Solid-State Electronics, 74, 19, 2012
6 Manipulation of Rectangular Arrangement of Se-Ring-Type Molecules on Graphite (Highly Oriented Pyrolytic-Graphite) Surfaces
Czajka R, Kasuya A, Horiguchi N, Nishina Y
Journal of Vacuum Science & Technology B, 12(3), 1890, 1994