검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Environmental stability of 193 nm single layer chemically amplified resists Timko AG, Houlihan FM, Cirelli RA, Nalamasu O, Yoshino H, Itani T, Tanabe H, Kasama K Journal of Vacuum Science & Technology B, 17(1), 101, 1999 |
| 2 |
193 nm single layer resist strategies, concepts, and recent results Nalamasu O, Houlihan FM, Cirelli RA, Timko AG, Watson GP, Hutton RS, Kometani JM, Reichmanis E, Gabor A, Medina A, Slater S Journal of Vacuum Science & Technology B, 16(6), 3716, 1998 |
| 3 |
Resist design concepts for 193 nm lithography : Opportunities for innovation and invention Reichmanis E, Nalamasu O, Houlihan FM, Wallow TI, Timko AG, Cirelli R, Dabbagh G, Hutton RS, Novembre AE, Smith BW Journal of Vacuum Science & Technology B, 15(6), 2528, 1997 |
| 4 |
Synthesis of Cycloolefin Maleic-Anhydride Alternating Copolymers for 193 nm Imaging Houlihan FM, Wallow TI, Nalamasu O, Reichmanis E Macromolecules, 30(21), 6517, 1997 |
| 5 |
Selective Electroless Nickel Deposition on Patterned Phosphonate and Carboxylate Polymer-Films Schilling ML, Katz HE, Houlihan FM, Stein SM, Hutton RS, Taylor GN Journal of the Electrochemical Society, 143(2), 691, 1996 |
| 6 |
Photogenerated Acid-Catalyzed Formation of Phosphonic Phosphoric-Acids by Deprotection of Esters in Polymer-Films Schilling ML, Katz HE, Houlihan FM, Kometani JM, Stein SM, Nalamasu O Macromolecules, 28(1), 110, 1995 |
| 7 |
Glass-Transition Temperature (T(G)) Versus Fractional Conversion for a Linear Thermosetting Polyamic Acid Ester Polyimide System Venditti RA, Gillham JK, Chin E, Houlihan FM Journal of Applied Polymer Science, 53(4), 455, 1994 |