화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Hetero- and homogeneous three-dimensional hierarchical tungsten oxide nanostructures by hot-wire chemical vapor deposition
Houweling ZS, Harks PPRML, Kuang Y, van der Werf CHM, Geus JW, Schropp REI
Thin Solid Films, 575, 76, 2015
2 Hot-wire chemical vapor deposition of WO3-x thin films of various oxygen contents
Houweling ZS, Geus JW, Schropp REI
Materials Chemistry and Physics, 140(1), 89, 2013
3 Self-assembled isolated monodisperse NiO1+gamma nanoparticles as catalytic templates for nanomaterials synthesis
Houweling ZS, Geus JW, Harks PPRML, Heller R, Schropp REI
Materials Chemistry and Physics, 135(1), 38, 2012
4 Growth process conditions of tungsten oxide thin films using hot-wire chemical vapor deposition
Houweling ZS, Geus JW, de Jong M, Harks PPRML, van der Werf KHM, Schropp REI
Materials Chemistry and Physics, 131(1-2), 375, 2011
5 Reversibility of silicidation of Ta filaments in HWCVD of thin film silicon
van der Werf CHM, Li H, Verlaan V, Oliphant CJ, Bakker R, Houweling ZS, Schropp REI
Thin Solid Films, 517(12), 3431, 2009
6 Effect of ammonia on Ta filaments in the hot wire CVD process
Verlaan V, van der Werf CHM, Oliphant CJ, Bakker R, Houweling ZS, Schropp REI
Thin Solid Films, 517(12), 3435, 2009
7 The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD
Verlaan V, Verkerk AD, Arnoldbik WM, van der Werf CHM, Bakker R, Houweling ZS, Romijn IG, Borsa DM, Weeber AW, Luxembourg SL, Zeman M, Dekkers HFW, Schropp REI
Thin Solid Films, 517(12), 3499, 2009
8 Formation of isolated carbon nanofibers with hot-wire CVD using nanosphere lithography as catalyst patterning technique
Houweling ZS, Verlaan V, ten Grotenhuis GT, Schropp REI
Thin Solid Films, 517(12), 3566, 2009
9 All hot wire CVD TFTs with high deposition rate silicon nitride (3 nm/s)
Schropp REI, Nishizaki S, Houweling ZS, Verlaan V, van der Werf CHM, Matsumura H
Solid-State Electronics, 52(3), 427, 2008
10 Hot Wire CVD for thin film triple junction cells and for ultrafast deposition of the SiN passivation layer on polycrystalline Si solar cells
Schropp REI, Franken RH, Goldbach HD, Houweling ZS, Li H, Rath JK, Schuettauf JWA, Stolk RL, Verlaan V, van der Werf CHM
Thin Solid Films, 516(5), 496, 2008