검색결과 : 2건
No. | Article |
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1 |
Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask Dreeskornfeld L, Haindl G, Kleineberg U, Heinzmann U, Shi F, Volland B, Rangelow IW, Majkova E, Luby S, Kostic, Matay L, Hrkut P, Hudek P, Lee HY Thin Solid Films, 458(1-2), 227, 2004 |
2 |
Directly sputtered stress-compensated carbon protective layer for silicon stencil masks Hudek P, Hrkut P, Drzik M, Kostic I, Belov M, Torres J, Wasson J, Wolfe JC, Degen A, Rangelow IW, Voigt J, Butschke J, Letzkus F, Springer R, Ehrmann A, Kaesmaier R, Kragler K, Mathuni J, Haugeneder E, Loschner H Journal of Vacuum Science & Technology B, 17(6), 3127, 1999 |