화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask
Dreeskornfeld L, Haindl G, Kleineberg U, Heinzmann U, Shi F, Volland B, Rangelow IW, Majkova E, Luby S, Kostic, Matay L, Hrkut P, Hudek P, Lee HY
Thin Solid Films, 458(1-2), 227, 2004
2 Directly sputtered stress-compensated carbon protective layer for silicon stencil masks
Hudek P, Hrkut P, Drzik M, Kostic I, Belov M, Torres J, Wasson J, Wolfe JC, Degen A, Rangelow IW, Voigt J, Butschke J, Letzkus F, Springer R, Ehrmann A, Kaesmaier R, Kragler K, Mathuni J, Haugeneder E, Loschner H
Journal of Vacuum Science & Technology B, 17(6), 3127, 1999