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| No. | Article |
|---|---|
| 1 |
Comparison of Multipolar and Magnetic-Mirror Electron-Cyclotron-Resonance Sources for CH4 H-2 Dry-Etching of III-V Semiconductors Pearton SJ, Abernathy CR, Kopf RF, Ren F, Hubson WS Journal of Vacuum Science & Technology B, 12(3), 1333, 1994 |