화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Interfacial diffusion studies of Cu/(5 nm Ru)/Si structures - Physical vapor deposited vs electrochemically deposited Cu
Arunagiri TN, Zhang YB, Chyan O, Kim MJ, Hurd TQ
Journal of the Electrochemical Society, 152(11), G808, 2005
2 Diffusion studies of copper on ruthenium thin film - A plateable copper diffusion barrier
Chan R, Arunagiri TN, Zhang Y, Chyan O, Wallace RM, Kim MJ, Hurd TQ
Electrochemical and Solid State Letters, 7(8), G154, 2004
3 Impact of Fe and Cu Contamination on the Minority-Carrier Lifetime of Silicon Substrates
Rotondaro AL, Hurd TQ, Kaniava A, Vanhellemont J, Simoen E, Heyns MM, Claeys C
Journal of the Electrochemical Society, 143(9), 3014, 1996