검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Formation and characterization of self-assembled monolayers of octadecyltrimethoxysilane on chromium : Application in low-energy electron lithography Hild R, David C, Muller HU, Volkel B, Kayser DR, Grunze M Langmuir, 14(2), 342, 1998 |
| 2 |
Low-Energy Focused-Ion-Beam Exposure Characteristics of an Amorphous Se75Ge25 Resist Lee HY, Chung HB Journal of Vacuum Science & Technology B, 15(4), 818, 1997 |
| 3 |
Ag2Te/As2S3, a Top-Surface, High-Contrast Negative-Tone Resist for Deep-Ultraviolet Submicron Lithography Dumford SA, Lavine JM Journal of Vacuum Science & Technology B, 12(1), 44, 1994 |