검색결과 : 15건
| No. | Article |
|---|---|
| 1 |
Graphene as Barrier to Prevent Volume Increment of Air Bubbles over Silicone Polymer in Aqueous Environment Bartali R, Lamberti A, Bianco S, Pirri CF, Tripathi M, Gottardi G, Speranza G, Iacob E, Pugno N, Laidani N Langmuir, 33(45), 12865, 2017 |
| 2 |
Experimental study by Secondary Ion Mass Spectrometry focused on the relationship between hardness and sputtering rate in hard coatings Onorati E, Iacob E, Bartali R, Barozzi M, Gennaro S, Bersani M Thin Solid Films, 625, 35, 2017 |
| 3 |
Development of nanotopography during SIMS characterization of thin films of Ge1-xSnx alloy Secchi M, Demenev E, Colaux JL, Giubertoni D, Dell'Anna R, Iacob E, Gwilliam M, Jeynes C, Bersani M Applied Surface Science, 356, 422, 2015 |
| 4 |
Ultralow energy boron implants in silicon characterization by nonoxidizing secondary ion mass spectrometry analysis and soft x-ray grazing incidence x-ray fluorescence techniques Giubertoni D, Iacob E, Hoenicke P, Beckhoff B, Pepponi G, Gennaro S, Bersani M Journal of Vacuum Science & Technology B, 28(1), C1C84, 2010 |
| 5 |
Dynamic secondary ion mass spectrometry and X-ray photoelectron spectroscopy on artistic bronze and copper artificial patinas Balta IZ, Pederzoli S, Iacob E, Bersani M Applied Surface Science, 255(12), 6378, 2009 |
| 6 |
ToF-SIMS and AFM studies of low-k dielectric etching in fluorocarbon plasmas Lazzeri P, Hua X, Oehrlein G, Iacob E, Barozzi M, Bersani M, Anderle M Applied Surface Science, 252(19), 7186, 2006 |
| 7 |
Comparison between the SIMS and MEIS techniques for the characterization of ultra shallow arsenic implants Giubertoni D, Bersani A, Barozzi M, Pederzoli S, Iacob E, van den Berg JA, Werner M Applied Surface Science, 252(19), 7214, 2006 |
| 8 |
Influence of changes in the resistivity of the sample surface on ultra-shallow SIMS profiles for arsenic Barozzi M, Giubertoni D, Pederzoli S, Anderle M, Iacob E, Bersani M Applied Surface Science, 252(19), 7286, 2006 |
| 9 |
Boron ultra low energy SIMS depth profiling improved by rotating stage Bersani M, Giubertoni D, Iacob E, Barozzi M, Pederzoli S, Vanzetti L, Anderle M Applied Surface Science, 252(19), 7315, 2006 |
| 10 |
Damage of ultralow k materials during photoresist mask stripping process Hua XF, Kuo MS, Oehrlein GS, Lazzeri P, Iacob E, Anderle M, Inoki CK, Kuan TS, Jiang P, Wu WL Journal of Vacuum Science & Technology B, 24(3), 1238, 2006 |