검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Direct Analysis of Contamination in Submicron Contact Holes by Thermal-Desorption Spectroscopy Aoki H, Teraoka Y, Ikawa E, Kikkawa T, Nishiyama I Journal of Vacuum Science & Technology A, 13(1), 42, 1995 |
| 2 |
Thermal-Desorption Spectroscopic Analysis for Residual Chlorine on Al-Si-Cu After Cl-2 Electron-Cyclotron-Resonance Plasma-Etching Teraoka Y, Aoki H, Nishiyama I, Ikawa E, Kikkawa T Journal of Vacuum Science & Technology A, 13(6), 2935, 1995 |
| 3 |
Observation of Sidewall Contamination in Submicron Contact Holes by Thermal-Desorption Spectroscopy Teraoka Y, Aoki H, Ikawa E, Kikkawa T, Nishiyama I Journal of Vacuum Science & Technology B, 13(6), 2197, 1995 |
| 4 |
Reactive Ion Etching Lag on High-Rate Oxide Etching Using High-Density Plasma Akimoto T, Nanbu H, Ikawa E Journal of Vacuum Science & Technology B, 13(6), 2390, 1995 |
| 5 |
Multilayer Resist Dry-Etching Technology for Deep-Submicron Lithography Tokashiki K, Sato K, Aoto N, Ikawa E Journal of Vacuum Science & Technology B, 11(6), 2284, 1993 |