검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Scale-up of a parallel plate RF plasma etching reactor by using reactive gas flow simulations Ikegawa M, Tamai T, Morita K, Maeda K Journal of the Electrochemical Society, 148(8), G456, 2001 |
| 2 |
Effects of gas-flow structures on radical and etch-product density distributions on wafers in magnetomicrowave plasma etching reactors Ikegawa M, Kobayashi J, Fukuyama R Journal of Vacuum Science & Technology A, 19(2), 460, 2001 |
| 3 |
Molecular-Beam Sampling to Analyze the Reaction-Mechanism of Chemical-Vapor-Deposition Tsutsumi Y, Ikegawa M, Usui T, Ichikawa Y, Watanabe K, Kobayashi J Journal of Vacuum Science & Technology A, 14(4), 2337, 1996 |