화학공학소재연구정보센터
검색결과 : 17건
No. Article
1 Probing the chemical interaction between different carbon allotropes oxides and titanium dioxide nanoparticles by Raman spectroscopy
Corio P, Silva KC, Soares NA, Inoue F, Santos JJ
Chemical Physics Letters, 723, 96, 2019
2 Influence of Si wafer thinning processes on (sub)surface defects
Inoue F, Jourdain A, Peng L, Phommahaxay A, De Vos J, Rebibis KJ, Miller A, Sleeckx E, Beyne E, Uedono A
Applied Surface Science, 404, 82, 2017
3 Nucleation and growth kinetics of electrodeposited Ni films on Si(100) surfaces
Philipsen H, Jehoul H, Inoue F, Vandersmissen K, Yang L, Struyf H, van Dorp D
Electrochimica Acta, 230, 407, 2017
4 Mitotic chromosome assembly despite nucleosome depletion in Xenopus egg extracts
Shintomi K, Inoue F, Watanabe H, Ohsumi K, Ohsugi M, Hirano T
Science, 356(6344), 1284, 2017
5 Nucleation Kinetics of Electroless Cu Deposition on Ruthenium Using Glyoxylic Acid as a Reducing Agent
Inoue F, Philipsen H, van der Veen MH, Van Huylenbroeck S, Armini S, Struyf H, Tanaka T
Journal of the Electrochemical Society, 161(14), D768, 2014
6 Electroless Cu deposition on atomic layer deposited Ru as novel seed formation process in through-Si vias
Inoue F, Philipsen H, Radisic A, Armini S, Civale Y, Leunissen P, Kondo M, Webb E, Shingubara S
Electrochimica Acta, 100, 203, 2013
7 Adsorption of Pd nanoparticles catalyst in high aspect ratio through-Si vias for electroless deposition
Inoue F, Shimizu T, Miyake H, Arima R, Ito T, Seki H, Shinozaki Y, Yamamoto T, Shingubara S
Electrochimica Acta, 82, 372, 2012
8 Electroless Copper Bath Stability Monitoring with UV-VIS Spectroscopy, pH, and Mixed Potential Measurements
Inoue F, Philipsen H, Radisic A, Armini S, Civale Y, Shingubara S, Leunissen P
Journal of the Electrochemical Society, 159(7), D437, 2012
9 Formation of electroless barrier and seed layers in a high aspect ratio through-Si vias using Au nanoparticle catalyst for all-wet Cu filling technology
Inoue F, Shimizu T, Yokoyama T, Miyake H, Kondo K, Saito T, Hayashi T, Tanaka S, Terui T, Shingubara S
Electrochimica Acta, 56(17), 6245, 2011
10 Perfect Conformal Deposition of Electroless Cu for High Aspect Ratio Through-Si Vias
Inoue F, Harada Y, Koyanagi M, Fukushima T, Yamamoto K, Tanaka S, Wang Z, Shingubara S
Electrochemical and Solid State Letters, 12(10), H381, 2009