화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 The influence on electrical characteristics of amorphous indium tungsten oxide thin film transistors with multi-stacked active layer structure
Ruan DB, Liu PT, Gan KJ, Chiu YC, Yu MC, Chien TC, Chen YH, Kuo PY, Sze SM
Thin Solid Films, 666, 94, 2018
2 Effect of interfacial layer on device performance of metal oxide thin-film transistor with a multilayer high-k gate stack
Ruan DB, Liu PT, Chiu YC, Kuo PY, Yu MC, Kan KZ, Chien TC, Chen YH, Sze SM
Thin Solid Films, 660, 578, 2018