| 1 |
Diagnostic study of argon and oxygen mixtures in dual-frequency capacitively coupled plasmas using quadrupole mass spectrometer
Jiang XZ, Li WL, Wumaier TED, Yao HB
Chemical Physics Letters, 730, 472, 2019 |
| 2 |
Peculiarities of Si and SiO2 Etching Kinetics in HBr+Cl-2+O-2 Inductively Coupled Plasma
Lee BJ, Efremov A, Kim J, Kim C, Kwon KH
Plasma Chemistry and Plasma Processing, 39(1), 339, 2019 |
| 3 |
Etching Mechanisms and Surface Conditions for SiOxNy Thin Films in CF4+CHF3+O-2 Inductively Coupled Plasma
Lee J, Kim J, Efremov A, Kim C, Lee HW, Kwon KH
Plasma Chemistry and Plasma Processing, 39(4), 1127, 2019 |
| 4 |
Gas-phase chemistry and etching mechanism of SiNx thin films in C4F8 + Ar inductively coupled plasma
Lim N, Efremov A, Kwon KH
Thin Solid Films, 685, 97, 2019 |
| 5 |
Effects of injected ion energy on silicon carbide film formation by low-energy SiCH3+ beam irradiation
Yoshimura S, Sugimoto S, Takeuchi T, Murai K, Kiuchi M
Thin Solid Films, 685, 408, 2019 |
| 6 |
High energy storage properties of (Ni1/3Nb2/3)(4+) complex-ion modified (Ba0.85Ca0.15)(Zr0.10Ti0.90)O-3 ceramics
Zhou MX, Liang RH, Zhou ZY, Xu CH, Nie X, Chen XF, Dong XL
Materials Research Bulletin, 98, 166, 2018 |
| 7 |
On the role of the energetic species in TiN thin film growth by reactive deep oscillation magnetron sputtering in Ar/N-2
Oliveira JC, Fernandes F, Serra R, Cavaleiro A
Thin Solid Films, 645, 253, 2018 |
| 8 |
Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
Iwashita S, Denpoh K, Kagaya M, Kikuchi T, Noro N, Hasegawa T, Moriya T, Uedono A
Thin Solid Films, 660, 865, 2018 |
| 9 |
Evolution of the nitrogen depth distribution in an implanted titanium alloy with a surface carbon nanolayer
Vlcak P, Horazdovsky T, Valenta R, Kovac J
Chemical Physics Letters, 679, 25, 2017 |
| 10 |
One-Step Synthesis of Silicon Oxynitride Films Using a Steady-State and High-Flux Helicon-Wave Excited Nitrogen Plasma
Huang TY, Jin CG, Yu J, Yang Y, Zhuge LJ, Wu XM, Sha ZD
Plasma Chemistry and Plasma Processing, 37(4), 1237, 2017 |
