화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Lateral growth and three-dimensional effects in contacts between NiSi0.82Ge0.18 and p(+)-Si0.82Ge0.18
Persson S, Isheden C, Jarmar T, Zhang SL
Thin Solid Films, 489(1-2), 159, 2005
2 MOSFETs with recessed SiGe source/drain junctions formed by selective etching and growth
Isheden C, Hellstrom PE, Radamson HH, Zhang SL, Ostling M
Electrochemical and Solid State Letters, 7(4), G53, 2004
3 Formation of shallow junctions by HCl-based Si etch followed by selective epitaxy of B-doped Si1-xGex in RPCVD
Isheden C, Radamson HH, Suvar E, Hellstrom PE, Ostling M
Journal of the Electrochemical Society, 151(6), C365, 2004