검색결과 : 16건
| No. | Article |
|---|---|
| 1 |
Participation of cysteine 30 residue in the folding process of ovalbumin evaluated in a refolding experiment using cysteine mutants Ishimaru T, Ito K, Tanaka M, Matsudomi N Biochemical and Biophysical Research Communications, 495(1), 1061, 2018 |
| 2 |
Vacuum ultraviolet photoconductive detector based on pulse laser deposition-grown neodymium fluoride thin film Ishimaru T, Ieda M, Ono S, Yokota Y, Yanagida T, Yoshikawa A Thin Solid Films, 534, 12, 2013 |
| 3 |
Reconsideration of the Concept of Fluid Mixing Okada B, Ishimaru T, Hashimoto S, Inoue Y KAGAKU KOGAKU RONBUNSHU, 37(1), 4, 2011 |
| 4 |
Importance of N-glycosylation positioning for secretion and folding of ovalbumin Ito K, Ishimaru T, Kimura F, Matsudomi N Biochemical and Biophysical Research Communications, 361(3), 725, 2007 |
| 5 |
Depth profiling of fluorine-doped diamond-like carbon (F-DLC) film: Localized fluorine in the top-most thin layer can enhance the non-thrombogenic properties of F-DLC Hasebe T, Nagashima S, Kamijo A, Yoshimura T, Ishimaru T, Yoshimoto Y, Yohena S, Kodama H, Hotta A, Takahashi K, Suzuki T Thin Solid Films, 516(2-4), 299, 2007 |
| 6 |
Identification of NADH dehydrogenase 1 alpha subcomplex 5 capable to transforms murine fibroblasts and overexpressed in human cervical carcinoma cell lines Shimada T, Moriuchi R, Mori T, Yamada K, Ishimaru T, Katamine S Biochemical and Biophysical Research Communications, 339(3), 852, 2006 |
| 7 |
Lewis acid-catalyzed enantioselective hydroxylation reactions of oxindoles and beta-keto esters using DBFOX ligand Ishimaru T, Shibata N, Nagai J, Nakamura S, Toru T, Kanemasa S Journal of the American Chemical Society, 128(51), 16488, 2006 |
| 8 |
Copper barrier properties of low dielectric constant SiOCNH film deposited by plasma-enhanced CVD Shioya Y, Ishimaru T, Ikakura H, Nishimoto Y, Ohdaira T, Suzuki R, Maeda K Journal of the Electrochemical Society, 151(1), C56, 2004 |
| 9 |
The effects of dilution gas and pressure on the properties of PE-CVD low-k film Shioya Y, Kotake Y, Ishimaru T, Masubuchi T, Ikakura H, Ohgawara S, Maeda K Journal of the Electrochemical Society, 150(2), F1, 2003 |
| 10 |
Properties of low-k copper barrier SiOCH film deposited by PECVD using hexamethyldisiloxane and N2O Ishimaru T, Shioya Y, Ikakura H, Nozawa M, Ohgawara S, Ohdaira T, Suzuki R, Maeda K Journal of the Electrochemical Society, 150(5), F83, 2003 |