화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Graphene on hexagonal boron nitride as a tunable hyperbolic metamaterial
Dai S, Ma Q, Liu MK, Andersen T, Fei Z, Goldflam MD, Wagner M, Watanabe K, Taniguchi T, Thiemens M, Keilmann F, Janssen GCAM, Zhu SE, Jarillo-Herrero P, Fogler MM, Basov DN
Nature Nanotechnology, 10(8), 682, 2015
2 Celebrating the 100th anniversary of the Stoney equation for film stress: Developments from polycrystalline steel strips to single crystal silicon wafers
Janssen GCAM, Abdalla MM, van Keulen F, Pujada BR, van Venrooy B
Thin Solid Films, 517(6), 1858, 2009
3 Stress and strain in titanium nitride thin films
Machunze R, Janssen GCAM
Thin Solid Films, 517(20), 5888, 2009
4 Stress and texture in HIPIMS TiN thin films
Machunze R, Ehiasarian AP, Tichelaar FD, Janssen GCAM
Thin Solid Films, 518(5), 1561, 2009
5 Anisotropic microstructure of physical vapor deposited coatings caused by anisotropy in flux distribution of arriving atoms
Grachev SY, Kamminga JD, Janssen GCAM, Smy T, Tichelaar FD
Journal of Vacuum Science & Technology A, 25(4), 1184, 2007
6 Stress and strain in polycrystalline thin films
Janssen GCAM
Thin Solid Films, 515(17), 6654, 2007
7 Anisotropic growth of chromium films during sputter deposition on substrates in planetary motion
Janssen GCAM, Alkemade PFA, Sivel VGM, Grachev SY, Kamminga JD
Journal of Vacuum Science & Technology A, 22(4), 1773, 2004
8 Beneficial influence of continuous ion bombardment during reactive sputter deposition of chromium nitride films
Janssen GCAM, Hoy R
Journal of Vacuum Science & Technology A, 21(3), 569, 2003
9 Influence of SiH2Cl2 on the kinetics of the chemical vapor deposition of tungsten by SiH4 reduction of WF6
Jongste JF, Oosterlaken TGM, Janssen GCAM, Radelaar S
Journal of the Electrochemical Society, 146(1), 167, 1999
10 TiN reactive sputter deposition studied as a function of the pumping speed
Heuvelman WM, Helderman P, Janssen GCAM, Radelaar S
Thin Solid Films, 332(1-2), 335, 1998