검색결과 : 11건
No. | Article |
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1 |
Graphene on hexagonal boron nitride as a tunable hyperbolic metamaterial Dai S, Ma Q, Liu MK, Andersen T, Fei Z, Goldflam MD, Wagner M, Watanabe K, Taniguchi T, Thiemens M, Keilmann F, Janssen GCAM, Zhu SE, Jarillo-Herrero P, Fogler MM, Basov DN Nature Nanotechnology, 10(8), 682, 2015 |
2 |
Celebrating the 100th anniversary of the Stoney equation for film stress: Developments from polycrystalline steel strips to single crystal silicon wafers Janssen GCAM, Abdalla MM, van Keulen F, Pujada BR, van Venrooy B Thin Solid Films, 517(6), 1858, 2009 |
3 |
Stress and strain in titanium nitride thin films Machunze R, Janssen GCAM Thin Solid Films, 517(20), 5888, 2009 |
4 |
Stress and texture in HIPIMS TiN thin films Machunze R, Ehiasarian AP, Tichelaar FD, Janssen GCAM Thin Solid Films, 518(5), 1561, 2009 |
5 |
Anisotropic microstructure of physical vapor deposited coatings caused by anisotropy in flux distribution of arriving atoms Grachev SY, Kamminga JD, Janssen GCAM, Smy T, Tichelaar FD Journal of Vacuum Science & Technology A, 25(4), 1184, 2007 |
6 |
Stress and strain in polycrystalline thin films Janssen GCAM Thin Solid Films, 515(17), 6654, 2007 |
7 |
Anisotropic growth of chromium films during sputter deposition on substrates in planetary motion Janssen GCAM, Alkemade PFA, Sivel VGM, Grachev SY, Kamminga JD Journal of Vacuum Science & Technology A, 22(4), 1773, 2004 |
8 |
Beneficial influence of continuous ion bombardment during reactive sputter deposition of chromium nitride films Janssen GCAM, Hoy R Journal of Vacuum Science & Technology A, 21(3), 569, 2003 |
9 |
Influence of SiH2Cl2 on the kinetics of the chemical vapor deposition of tungsten by SiH4 reduction of WF6 Jongste JF, Oosterlaken TGM, Janssen GCAM, Radelaar S Journal of the Electrochemical Society, 146(1), 167, 1999 |
10 |
TiN reactive sputter deposition studied as a function of the pumping speed Heuvelman WM, Helderman P, Janssen GCAM, Radelaar S Thin Solid Films, 332(1-2), 335, 1998 |