화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 The effects of argon and helium dilution in the growth of nc-Si:H thin films by plasma-enhanced chemical vapor deposition
Chaibi F, Jemai R, Aguas H, Khemakhem H, Khirouni K
Journal of Materials Science, 53(5), 3672, 2018
2 Admittance spectroscopy and complex impedance analysis of Ti-modified La0.7Sr0.3MnO3
Rahmouni H, Jemai R, Nouiri M, Kallel N, Rzigua F, Selmi A, Khirouni K, Alaya S
Journal of Crystal Growth, 310(3), 556, 2008