검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections Myers AM, Lorusso GF, Kim I, Goethals AM, Jonckheere R, Hermans J, Baudemprez B, Ronse K Journal of Vacuum Science & Technology B, 26(6), 2215, 2008 |
| 2 |
Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy Lorusso GF, Goethals AM, Jonckheere R, Hermans J, Ronse K, Myers AM, Niroomand A, Kim I, Niroomand A, Iwamoto F, Ritter D Journal of Vacuum Science & Technology B, 25(6), 2127, 2007 |
| 3 |
Fabrication of 100 nm pitch copper interconnects by electron beam lithography Wu W, Jonckheere R, Tokei Z, Brongersma SH, Van Hove M, Maez K Journal of Vacuum Science & Technology B, 22(4), L11, 2004 |
| 4 |
Experimental and simulation comparison of electron-beam proximity correction Leunissen LHA, Jonckheere R, Hofmann U, Unal N, Kalus C Journal of Vacuum Science & Technology B, 22(6), 2943, 2004 |
| 5 |
In-plane vector magnetometry on rectangular Co dots using polarized neutron reflectivity Temst K, Van Bael MJ, Swerts J, Buntinx D, Van Haesendonck C, Bruynseraede Y, Fritzsche H, Jonckheere R Journal of Vacuum Science & Technology B, 21(5), 2043, 2003 |
| 6 |
Influence of gate patterning on line edge roughness Leunissen LHA, Jonckheere R, Ronse K, Derksen GB Journal of Vacuum Science & Technology B, 21(6), 3140, 2003 |
| 7 |
Characterization and Correction of Optical Proximity Effects in Deep-Ultraviolet Lithography Using Behavior Modeling Yen A, Tritchkov A, Stirniman JP, Vandenberghe G, Jonckheere R, Ronse K, Vandenhove L Journal of Vacuum Science & Technology B, 14(6), 4175, 1996 |
| 8 |
Use of Positive and Negative Chemically Amplified Resists in Electron-Beam Direct-Write Lithography Tritchkov A, Jonckheere R, Vandenhove L Journal of Vacuum Science & Technology B, 13(6), 2986, 1995 |
| 9 |
Effect of Sample Topology on the Critical Fields of Mesoscopic Superconductors Moshchalkov VV, Gielen L, Strunk C, Jonckheere R, Qiu X, Vanhaesendonck C, Bruynseraede Y Nature, 373(6512), 319, 1995 |
| 10 |
Molybdenum Silicide Based Attenuated Phase-Shift Masks Jonckheere R, Ronse K, Popa O, Vandenhove L Journal of Vacuum Science & Technology B, 12(6), 3765, 1994 |