검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Dynamic simulations of pulsed reactive sputtering processes Jonsson LB, Nyberg T, Berg S Journal of Vacuum Science & Technology A, 18(2), 503, 2000 |
| 2 |
Patterning of tantalum pentoxide, a high epsilon material, by inductively coupled plasma etching Jonsson LB, Westlinder J, Engelmark F, Hedlund C, Du J, Smith U, Blom HO Journal of Vacuum Science & Technology B, 18(4), 1906, 2000 |
| 3 |
Frequency response in pulsed DC reactive sputtering processes Jonsson LB, Nyberg T, Katardjiev I, Berg S Thin Solid Films, 365(1), 43, 2000 |
| 4 |
Target compound layer formation during reactive sputtering Jonsson LB, Nyberg T, Berg S Journal of Vacuum Science & Technology A, 17(4), 1827, 1999 |
| 5 |
Compositional variations of sputter deposited Ti/W barrier layers on substrates with pronounced surface topography Jonsson LB, Hedlund C, Katardjiev IV, Berg S Thin Solid Films, 348(1-2), 227, 1999 |
| 6 |
Selective SiO2-to-Si3N4 etching in inductively coupled fluorocarbon plasmas : Angular dependence of SiO2 and Si3N4 etching rates Schaepkens M, Oehrlein GS, Hedlund C, Jonsson LB, Blom HO Journal of Vacuum Science & Technology A, 16(6), 3281, 1998 |
| 7 |
Angular-Dependence of the Polysilicon Etch Rate During Dry-Etching in SF6 and Cl-2 Hedlund C, Jonsson LB, Katardjiev IV, Berg S, Blom HO Journal of Vacuum Science & Technology A, 15(3), 686, 1997 |
| 8 |
Discharge Disruptions in a Helicon Plasma Source Shamrai KP, Virko VF, Blom HO, Pavlenko VP, Taranov VB, Jonsson LB, Hedlund C, Berg S Journal of Vacuum Science & Technology A, 15(6), 2864, 1997 |